Alfa Chemistry Materials 3 - Products
Alfa Chemistry Materials is specialized in material chemistry and offers an extensive catalog of materials in a wide range of applications, including Metals and Materials, 3D Printing Materials, Biomaterials.
| Product | Description | |
|---|---|---|
| Tin Selenide (SnSe) | SnSe has a layered structure (layered) with weak interlayer coupling and can be isolated into a single layer. Each monolayer is four atoms thick (Se-Sn-Sn-Se), approximately 0.9-1.0 nm. Uses: More recently, snse has been shown to display world record performance for thermoelectric material efficiency. Group: Magnetic nanoparticles. Alternative Names: Tin Selenide Powder, SnSe Powder, tin selenide; tin(II) selenide; stannous selenide. 99.9999% confirmed purity. |  |
| Tin Selenide (SnSe) Sputtering Targets | Tin Selenide (SnSe) Sputtering Targets. Group: Sputtering targets. Alternative Names: Tin Selenide (SnSe) Sputtering Targets, SnSe Sputtering Target, SnSe Sputter Target, SnSe Target, Tin Selenide Sputtering Target, Tin Selenide Sputter Target, Tin Selenide Target. 99.9%. | |
| Tin Silver Paste | Tin Silver Paste. Group: Conductive ink/paste. Mole weight: SnAg. 99.9%. | |
| Tin (Sn) | Tin (Sn). Group: Magnetic nanoparticles. Alternative Names: High Purity Tin (Sn); 99.99% Tin (Sn); 99.999% Tin (Sn); 99.9999% Tin (Sn). 4N-6N. | |
| Tin Sn Powder | Tin Sn Powder. Uses: Metal electric padding, lubricant, conductive slurry, etc. Group: Element powders. CAS No. 7440-31-5. Molecular formula: 118.71. Mole weight: Sn. >99.5%. | |
| Tin (Sn) Sputtering Targets | Tin (Sn) Sputtering Targets. Group: Sputtering targets. Alternative Names: Tin (Sn) Sputtering Targets, Sn Sputtering Target, Sn Sputter Target, Sn Target, Tin Sputtering Target, Tin Sputter Target, Tin Target. CAS No. 12430-73-8. 99.99%. | |
| Tin Tantalate (SnTa2O6) Sputtering Targets | Tin Tantalate (SnTa2O6) Sputtering Targets. Group: Sputtering targets. Alternative Names: Tin Tantalate (SnTa2O6) Sputtering Targets, SnTa2O6 Sputtering Target, SnTa2O6 Sputter Target, SnTa2O6 Target, Tin Tantalate Sputtering Target, Tin Tantalate Sputter Target, Tin Tantalate Target. 99.99%. | |
| Tin Telluride (SnTe) | Tin Telluride (SnTe). Group: Magnetic nanoparticles. Alternative Names: Tin Telluride Powder, SnTe Powder, tin telluride; tin(II) telluride; stannous telluride. 99.999%. | |
| Tin Telluride (SnTe) Sputtering Targets | Tin Telluride (SnTe) Sputtering Targets. Group: Sputtering targets. Alternative Names: Tin Telluride (SnTe) Sputtering Targets, SnTe Sputtering Target, SnTe Sputter Target, SnTe Target, Tin Telluride Sputtering Target, Tin Telluride Sputter Target, Tin Telluride Target. 99.9%-99.99%. | |
| Tin Zinc (Sn-Zn) Alloy Sputtering Targets | Tin Zinc (Sn-Zn) Alloy Sputtering Targets. Group: Sputtering targets. Alternative Names: Tin Zinc (Sn-Zn) Alloy Sputtering Targets, Sn-Zn Alloy Sputtering Target, Sn-Zn Alloy Sputter Target, Sn-Zn Alloy Target, Tin Zinc Alloy Sputtering Target, Tin Zinc Alloy Sputter Target, Tin Zinc Alloy Target. 99.9%-99.999%. | |
| TiO2 | TiO2. Group: Oxides nanoparticles. 99%. | |
| TiO2 103-80G | TiO2 103-80G. Group: Polymers. | |
| TiO2 Nanoparticles | TiO2 Nanoparticles. Group: Oxides nanoparticles. | |
| TiO2 nanopowder | TiO2 nanopowder. Group: Compounds nanoparticles. 99%. | |
| TiTaAlC (MAX) Phase Ceramic Material | TiTaAlC (MAX) Phase Ceramic Material. Uses: High temperature coating, mxene precursor, conductive self-lubricating ceramic, lithiumionbattery, super capacitor, electrochemical catalysis. Group: Mxene materials. >90%. | |
| titania nanofiber urchin | titania nanofiber urchin. Group: Nanofibers. | |
| Titania nanowire A | Titania nanowire A. Group: Nanowires. | |
| Titania nanowire B | Titania nanowire B. Group: Nanowires. | |
| Titania nanowire coating ink | Titania nanowire coating ink. Group: Nanowires. | |
| Titania nanowire Industry A | Titania nanowire Industry A. Group: Nanowires. | |
| Titania nanowire Industry B | Titania nanowire Industry B. Group: Nanowires. | |
| Titania Nanowires | Titania Nanowires. Group: Nanowires. | |
| Titanium Aluminide Powder | Titanium Aluminide Powder. Group: other nano materials. CAS No. 12004-78-3. Molecular formula: 128.81 g/mol. Mole weight: TiAl3. 99.9%. | |
| Titanium Aluminium Nitride Nanopowder | Titanium Aluminium Nitride Nanopowder. Group: Nanopowder compounds. Mole weight: TiAlN. >99.9%. | |
| Titanium Aluminum (Ti-Al) Alloy Sputtering Targets | Titanium Aluminum (Ti-Al) Alloy Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Aluminum (Ti-Al) Alloy Sputtering Targets, Ti-Al Alloy Sputtering Target, Ti-Al Alloy Sputter Target, Ti-Al Alloy Target, Titanium Aluminum Alloy Sputtering Target, Titanium Aluminum Alloy Sputter Target, Titanium Aluminum Alloy Target. 99.9%. | |
| Titanium Aluminum Vanadium (Ti-Al-V) Alloy Sputtering Targets | Titanium Aluminum Vanadium (Ti-Al-V) Alloy Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Aluminum Vanadium (Ti-Al-V) Alloy Sputtering Targets, Ti-Al-V Alloy Sputtering Target, Ti-Al-V Alloy Sputter Target, Ti-Al-V Alloy Target, Titanium Aluminum Vanadium Alloy Sputtering Target, Titanium Aluminum Vanadium Alloy Sputter Target. CAS No. 7440-50-8. 99.9%. | |
| Titanium atomic absorption standard solution | Titanium atomic absorption standard solution. Group: Reference-calibration standards. | |
| Titanium Attack Polish Etchant | Used as a CMP polishing compound for titanium. Group: Etchants. | |
| Titanium Boride/Boron Carbide nanoparticles | Titanium Boride/Boron Carbide nanoparticles. Group: Compounds nanoparticles. | |
| Titanium Boride/Boron Carbide/Tungsten Boride nanoparticles | Titanium Boride/Boron Carbide/Tungsten Boride nanoparticles. Group: Compounds nanoparticles. | |
| Titanium Boride nanoparticles | Titanium Boride nanoparticles. Group: Compounds nanoparticles. | |
| Titanium Boride (TiB2) | Titanium Boride (TiB2). Group: Magnetic nanoparticles. Alternative Names: High Purity Titanium Boride (TiB2); 99.9% Titanium Boride (TiB2); 99.99% Titanium Boride (TiB2); ; high purity titanium diboride; high purity titanium boride. 3N-4N. | |
| Titanium Boride (TiB2) Sputtering Targets | Titanium Boride (TiB2) Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Boride (TiB2) Sputtering Targets, TiB2 Sputtering Target, TiB2 Sputter Target, TiB2 Target, Titanium Boride Sputtering Target, Titanium Boride Sputter Target, Titanium Boride Target. 99.5%. | |
| Titanium Carbide Nanoparticles | Titanium Carbide Nanoparticles. Group: Nanopowder compounds. | |
| Titanium Carbide (TiC) | Titanium Carbide (TiC). Group: Magnetic nanoparticles. Alternative Names: High Purity Titanium Carbide (TiC); 99.9% Titanium Carbide (TiC); 99.99% Titanium Carbide (TiC); ; high purity titanium(IV) carbide; high purity titanium carbide. 3N-4N. | |
| Titanium Carbide (TiC) Sputtering Targets | Titanium Carbide (TiC) Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Carbide (TiC) Sputtering Targets, TiC Sputtering Target, TiC Sputter Target, TiC Target, Titanium Carbide Sputtering Target, Titanium Carbide Sputter Target, Titanium Carbide Target. 99.5%. | |
| Titanium Carbonitride nanoparticles | Titanium Carbonitride nanoparticles. Group: Compounds nanoparticles. | |
| Titanium Carbo-Nitride Nanopowder | Titanium Carbo-Nitride Nanopowder. Group: Nanopowder compounds. CAS No. 12654-86-3. Molecular formula: 121.75g/mol. Mole weight: Ti2CN. 99.9 %. | |
| Titanium Carbonitride (TiCN) Sputtering Targets | Titanium Carbonitride (TiCN) Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Carbonitride (TiCN) Sputtering Targets, TiCN Sputtering Target, TiCN Sputter Target, TiCN Target, Titanium Carbonitride Sputtering Target, Titanium Carbonitride Sputter Target, Titanium Carbonitride Target. CAS No. 12017-12-8. 99.5%. | |
| Titanium Carbon Nitride TiCN Powder | Titanium Carbon Nitride TiCN Powder. Group: Carbide powders. CAS No. 12654-86-3. Mole weight: TiCN. >99% or customized. | |
| Titanium coated Carbon Nanotubes | Titanium coated Carbon Nanotubes. Group: Metal and metal oxide nanoparticles coated cnt. | |
| Titanium Cobalt (Ti-Co) Alloy Sputtering Targets | Titanium Cobalt (Ti-Co) Alloy Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Cobalt (Ti-Co) Alloy Sputtering Targets, Ti-Co Alloy Sputtering Target, Ti-Co Alloy Sputter Target, Ti-Co Alloy Target, Titanium Cobalt Alloy Sputtering Target, Titanium Cobalt Alloy Sputter Target, Titanium Cobalt Alloy Target. CAS No. 1308-06-1. 99.9%-99.95%. | |
| Titanium diboride (?i?2) | Titanium diboride (?i?2). Group: Compounds nanoparticles. | |
| Titanium Diboride (TiB2) Powder | Titanium Diboride (TiB2) Powder. Group: other nano materials. Alternative Names: titanium diboride; titanium boride. CAS No. 7789-75-5. 99.%. | |
| Titanium Dioxide Dispersion Anatase | Titanium Dioxide Dispersion Anatase. Group: Oxide nano dispersion. CAS No. 13463-67-7. Mole weight: TiO2. >99.99%. | |
| Titanium Dioxide Dispersion Rutile | Titanium Dioxide Dispersion Rutile. Group: Oxide nano dispersion. CAS No. 13463-67-7. Mole weight: TiO2. >99.99%. | |
| Titanium dioxide nanoparticles | Titanium dioxide nanoparticles. Group: Compounds nanoparticles. | |
| Titanium Dioxide Nanopowder, Anatase Phase | Produced by chemical synthesis. Loss on thempering (800°C, 2 h) about 32%. Does not contain organic stabilizers. Easy to form colloidal solution in water. Group: other s. | |
| Titanium Dioxide Nanopowder, Anatase Phase, Hydrophobic | Stabilized by dodecylphosphonic acid and hexylamine. Forms transparent colloidal solutions in chloroform. Group: other s. | |
| Titanium Dioxide Nanopowder, P25 Grade | Mixed rutile/anatase phase Average primary particle size: 21±5 nm. Group: other s. >99.5% (after ignition). | |
| Titanium Dioxide Nanopowder, P25 Grade, Hydrophobized | Mixed rutile/anatase phase, treated with octylsilane Average primary particle size: 21±5 nm. Group: other s. >97% (after ignition). | |
| Titanium Dioxide Nanopowder, Rutile Phase | Readily forms colloidal solutions in water (up to 900g/L) and methanol. Group: other s. | |
| Titanium Dioxide Nanorods | Titanium Dioxide Nanorods. Group: Nanorods. CAS No. 13463-67-7. | |
| Titanium Dioxide (TiO2) | Titanium Dioxide (TiO2). Group: Magnetic nanoparticles. Alternative Names: High Purity Titanium Dioxide (TiO2); 99.9% Titanium Dioxide (TiO2); 99.99% Titanium Dioxide (TiO2); ; high purity titanium dioxide; high purity titanium(IV) oxide; high purity rutile; high purity titanium oxide. 3N-4N. | |
| Titanium Dioxide (TiO2) Photoelectric Crystal | Titanium Dioxide (TiO2) Photoelectric Crystal. Group: Magnetic nanoparticles. Alternative Names: TiO2 Wafers, TiO2 Substrate, TiO2 Slice, Titanium Dioxide Wafers, Titanium Dioxide Substrate, Titanium Dioxide Slice. | |
| Titanium Dioxide (TiO2) Sputtering Targets | Titanium Dioxide (TiO2) Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Dioxide (TiO2) Sputtering Targets, TiO2 Sputtering Target, TiO2 Sputter Target, TiO2 Target, Titanium Dioxide Sputtering Target, Titanium Dioxide Sputter Target, Titanium Dioxide Target. CAS No. 1308-04-9. 99.99%. | |
| Titanium Dioxide (Titania | Titanium Dioxide (Titania. Group: Oxides nanoparticles. 99.9%. | |
| Titanium Dioxide (Titania) Nano Powder | Titanium Dioxide (Titania) Nano Powder. Group: Oxides nanoparticles. 99.9%. | |
| Titanium-doped Sapphire (Ti: Al2O3) Crystal | Titanium-doped Sapphire (Ti: Al2O3) Crystal. Group: Magnetic nanoparticles. Alternative Names: Titanium-doped Sapphire Crystal, Ti: Al2O3 Crystal, Ti: Al2O3 Wafers, Ti: Al2O3 Substrate, Ti: Al2O3 Slice. | |
| Titanium Fluoride (TiF3) Sputtering Targets | Titanium Fluoride (TiF3) Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Fluoride (TiF3) Sputtering Targets, TiF3 Sputtering Target, TiF3 Sputter Target, TiF3 Target, Titanium Fluoride Sputtering Target, Titanium Fluoride Sputter Target, Titanium Fluoride Target. 99.9%. | |
| Titanium(IV) isopropoxide as Dorf Ketal Tyzor | Titanium(IV) isopropoxide as Dorf Ketal Tyzor. Group: Elements nanoparticles. 97 %. | |
| Titanium (IV) oxide nanoparticles | Titanium (IV) oxide nanoparticles. Group: Compounds nanoparticles. | |
| Titanium Monoxide (TiO) | Titanium Monoxide (TiO). Group: Magnetic nanoparticles. Alternative Names: High Purity Titanium Monoxide (TiO); 99.9% Titanium Monoxide (TiO); 99.99% Titanium Monoxide (TiO); ; high purity titanium oxide; high purity titanium(II) oxide; high purity titanium monoxide. 3N-4N. | |
| Titanium Monoxide (TiO) Sputtering Targets | Titanium Monoxide (TiO) Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Monoxide (TiO) Sputtering Targets, TiO Sputtering Target, TiO Sputter Target, TiO Target, Titanium Monoxide Sputtering Target, Titanium Monoxide Sputter Target, Titanium Monoxide Target. 99.99%. | |
| Titanium Nanoparticles | Titanium Nanoparticles. Group: Metal nano dispersion. | |
| Titanium Nanopowder | Titanium Nanopowder. Group: Nanofibers. 99.9%. | |
| Titanium Nickel (Ti-Ni) Alloy Sputtering Targets | Titanium Nickel (Ti-Ni) Alloy Sputtering Targets. Group: Sputtering targets. Alternative Names: Titanium Nickel (Ti-Ni) Alloy Sputtering Targets, Ti-Ni Alloy Sputtering Target, Ti-Ni Alloy Sputter Target, Ti-Ni Alloy Target, Titanium Nickel Alloy Sputtering Target, Titanium Nickel Alloy Sputter Target, Titanium Nickel Alloy Target. 99.9%. | |
| Titanium Nitride Nanoparticles | Titanium Nitride Nanoparticles. Group: Nanopowder compounds. | |
| Titanium Nitride (TiN) | Titanium Nitride (TiN). Group: Magnetic nanoparticles. Alternative Names: High Purity Titanium Nitride (TiN); 99.9% Titanium Nitride (TiN); 99.99% Titanium Nitride (TiN); ; high purity titanium nitride. 3N-4N. | |
| Titanium Nitride (TiN) Powder | Titanium Nitride (TiN) Powder. Group: other nano materials. Alternative Names: titanium nitride. CAS No. 1303-86-2. 99.9%. | |
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