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| Product | Description | |
|---|---|---|
| Tantalum Carbide | TANTALUM CARBIDE, 99.5% pure, -325 mesh, Formula: TaC. CAS No. 12070-06-3. Noah Chemicals San Antonio, Texas. ISO 9001:2015 Certified. Request a Quote Today! |  Texas TX |
| Tantalum Carbide Nanoparticles / Nanopowder | A mixture of tantalum carbide (TaC) and graphite is a very hard material and is used to form the cutting edge of machine tools. CAS No. 12070-06-3. Molecular formula: CTa. Mole weight: 192.96. Appearance: Brown to dark brown powder. Purity: 0.999. IUPACName: methanidylidynetantalum(1+). Canonical SMILES: [C-]#[Ta+]. Density: 14.30 g/cm³. ECNumber: 235-118-3. Catalog: ACM12070063-3. |  |
| Tantalum Carbide Nanoparticles / Nanopowder | Tantalum Carbide Nanoparticles / Nanopowder. Uses: A mixture of tantalum carbide (tac) and graphite is a very hard material and is used to form the cutting edge of machine tools. Group: 3d printing materials. CAS No. 12070-06-3. Product ID: methanidylidynetantalum(1+). Molecular formula: 192.96. Mole weight: CTa. [C-]#[Ta+]. InChI=1S/C.Ta/q-1;+1. DUMHRFXBHXIRTD-UHFFFAOYSA-N. 99.9%. |  |
| Tantalum Carbide Nanopowder/Nanoparticles | Tantalum Carbide Nanopowder/Nanoparticles. Uses: Tools, additive, coatings. Group: Compounds nanoparticles. 99.5%. | |
| Tantalum Carbide Powder | Tantalum Carbide Powder. Group: Nanopowder compounds. CAS No. 12070-06-3. Product ID: methanidylidynetantalum(1+). Molecular formula: 192.96 g/mol. Mole weight: TaC. [C-]#[Ta+]. 99.9%. | |
| Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) | Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis). Group: Evaporation materials. | |
| Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis) | Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.5% (metals basis). Group: Evaporation materials. | |
| Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis) | Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 3.18mm (0.125in) thick, 99.5% (metals basis). Group: Evaporation materials. | |
| Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis) | Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basis). Group: Evaporation materials. | |
| Tantalum Carbide (TaC) | Tantalum Carbide (TaC). Group: Magnetic nanoparticles. Alternative Names: High Purity Tantalum Carbide (TaC); 99.9% Tantalum Carbide (TaC); 99.99% Tantalum Carbide (TaC); ; high purity tantalum(IV) carbide; high purity tantalum carbide. 3N-4N. | |
| Tantalum Carbide (TaC) Powder | Tantalum Carbide (TaC) Powder. Group: other nano materials. Alternative Names: tantalum(IV) carbide; tantalum carbide. CAS No. 1315-03-3. 99.5%. | |
| Ditantalum monocarbide | Heterocyclic Organic Compound. Alternative Names: ditantalum monocarbide;Tantalum carbide sputtering target, 76.2mm (3.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering target, 50.8mm (2.0in) dia x 6.35mm (0.250in) thick, 99.95% (metals basi;Tantalum carbide sputtering t. CAS No. 12070-07-4. Molecular formula: CTa2. Mole weight: 192.96. Catalog: ACM12070074. | |
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