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insulated wire, 10m, conductor diameter 0.075mm, insulation thickness 0.02mm, PTFE (polytetrafluoroethylene) insulation, 99.9%. Uses: Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. the extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition. Additional or Alternative Names: W. Product Category: Metal & Ceramic Materials. CAS No. 7440-33-7. Molecular formula: W. Mole weight: 183.84. Purity: > 99.99%. IUPACName: tungsten. Canonical SMILES: [W]. Density: 19.3 (NIOSH, 2016);18.7-19.3 @ 20 °C/4 °C; depends on extent of working.;19.3 g/cm3;19.3. ECNumber: 231-143-9. Product ID: ACM7440337-33. Alfa Chemistry ISO 9001:2015 Certified.
Tungsten Silicide WSi2 Powder
Tungsten Silicide WSi2 Powder. Uses: Tungsten silicide is used in microelectronics as an electric shock material, a shunt on a polysilicon line, an anti-oxidation coating and a resistance wire coating. Group: Silicide powders. CAS No. 12039-88-2. Molecular formula: 240.01. Mole weight: WSi2. Customizable.
Tungsten (W) Evaporation Material
Tungsten (W) Evaporation Material. Group: Sputtering targets. Alternative Names: W Pellets, W Wire, W Pieces, Tungsten Pellets, Tungsten Wire, Tungsten Pieces, Tungsten Evaporation Material, W Evaporation Material, W Evapor Materials, Tungsten Evapor Materials. CAS No. 12067-66-2. 99.95%.
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